Semiconductor Device and Failure Analysis: Using Photon Emission Microscopy Wai Kin Chim

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Wai Kin Chim - «Semiconductor Device and Failure Analysis: Using Photon Emission Microscopy»

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The diminishing size and greater complexity of modern semiconductor integrated circuits poses new challenges in fault detection. Photon Emission Microscopy (PEM) is a physical fault localisation technique used for analysing IC failures. Detailing the PEM technique and its application to semiconductor device analysis, this unique reference:

  • Illustrates the application of the PEM technique in various areas of device reliability, in particular hot-carrier, oxide and ESD reliability.

  • Presents the principles of design and calibration for a spectroscopic emission microscope system along with coverage of the three main operation modes: frontside, backside and spectroscopic PEM.

  • Provides an analysis of light emission in semiconductors under hot-carrier and high-field impulse stressing in MOS transistors and photon emission from biased MOS capacitors.

    Not only an essential reference for researchers and students in the field, the numerous practical examples throughout the text also make this an indispensible guide for failure analysis engineers and microelectrics industry professionals. Это и многое другое вы найдете в книге Semiconductor Device and Failure Analysis: Using Photon Emission Microscopy (Wai Kin Chim)

  • Полное название книги Wai Kin Chim Semiconductor Device and Failure Analysis: Using Photon Emission Microscopy
    Автор Wai Kin Chim
    Ключевые слова издательство wiley, wiley-blackwell
    Категории Образование и наука
    ISBN 47149240
    Издательство John Wiley and Sons
    Год 2000
    Название транслитом semiconductor-device-and-failure-analysis-using-photon-emission-microscopy-wai-kin-chim
    Название с ошибочной раскладкой semiconductor device and failure analysis: using photon emission microscopy wai kin chim